Plasma processes for semiconductor fabrication / (Record no. 96513)
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000 -LEADER | |
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fixed length control field | 00576nam a2200169Ia 4500 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
fixed length control field | 160808s2007 xx 000 0 eng d |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
International Standard Book Number | 0521018005 |
041 ## - LANGUAGE CODE | |
Language code of text/sound track or separate title | eng |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
Classification number | 621.38152 |
100 ## - MAIN ENTRY--PERSONAL NAME | |
Personal name | Hitchon, W. N. G. |
245 ## - TITLE STATEMENT | |
Title | Plasma processes for semiconductor fabrication / |
Statement of responsibility, etc | by W. N. G. Hitchon |
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
Place of publication, distribution, etc | Cambridge : |
Name of publisher, distributor, etc | Cambridge University Press, |
Date of publication, distribution, etc | 2007. |
490 ## - SERIES STATEMENT | |
Series statement | Cambridge Studies in Semiconductor Physics and Microelectron |
653 ## - INDEX TERM--UNCONTROLLED | |
Uncontrolled term | Applied physics and engineering |
653 ## - INDEX TERM--UNCONTROLLED | |
Uncontrolled term | Plasma Processors - Semiconductor Fabrication |
Withdrawn status | Lost status | Damaged status | Not for loan | Collection code | Home library | Current library | Date acquired | Full call number | Barcode | Date last seen | Koha item type |
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BL | British Library | British Library | 11/08/2016 | 621.38152 HIT | BL20107 | 11/06/2019 | Lending |